A novel deposition technique for fluorocarbon films and its applications for bulk- and surface-micromachined devices

Yoshinori Matsumoto; Kazumasa Yoshida; Makoto Ishida

doi:10.1016/S0924-4247(97)01763-9

A novel deposition technique for fluorocarbon films and its applications for bulk- and surface-micromachined devices

Yoshinori Matsumoto, Kazumasa Yoshida, Makoto Ishida

Research output: Contribution to journal › Article › peer-review

48 Citations (Scopus)

Abstract

Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. First, FC film is spin-coated from cyclized perfluoro polymer (CPFP), commercialized as CYTOP. Because of its excellent durability for alkalis or acids, the FC film is used for protection of the circuit area of an integrated accelerometer from a silicon alkaline etching process by 25 wt.% TMAH at 90°C. Secondly, FC films are formed on a field-free zone with a capacitive-coupling-type plasma-polymerization equipment using perfluorinated liquids (C₇F₁₆, C₈F₁₈, etc.) as monomer species. The deposition rates and thermal stability of the films have been investigated. The FC films are effective for elimination of in-use stiction for surface-micromachined devices.

Original language	English
Pages (from-to)	308-314
Number of pages	7
Journal	Sensors and Actuators, A: Physical
Volume	66
Issue number	1-3
DOIs	https://doi.org/10.1016/S0924-4247(97)01763-9
Publication status	Published - 1998 Apr 1
Externally published	Yes

Keywords

CYTOP
Fluorocarbon film
In-use stiction
Integrated sensors
Plasma polymerization

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films
Metals and Alloys
Electrical and Electronic Engineering

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10.1016/S0924-4247(97)01763-9

Cite this

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title = "A novel deposition technique for fluorocarbon films and its applications for bulk- and surface-micromachined devices",

abstract = "Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. First, FC film is spin-coated from cyclized perfluoro polymer (CPFP), commercialized as CYTOP. Because of its excellent durability for alkalis or acids, the FC film is used for protection of the circuit area of an integrated accelerometer from a silicon alkaline etching process by 25 wt.% TMAH at 90°C. Secondly, FC films are formed on a field-free zone with a capacitive-coupling-type plasma-polymerization equipment using perfluorinated liquids (C7F16, C8F18, etc.) as monomer species. The deposition rates and thermal stability of the films have been investigated. The FC films are effective for elimination of in-use stiction for surface-micromachined devices.",

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author = "Yoshinori Matsumoto and Kazumasa Yoshida and Makoto Ishida",

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AU - Matsumoto, Yoshinori

AU - Yoshida, Kazumasa

AU - Ishida, Makoto

N1 - Funding Information: This work has been partly supported by the Japanese Ministry of Education, Science, Sports and Culture under a Grant-in-Aid for Encouragement of Young Scientists No.

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N2 - Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. First, FC film is spin-coated from cyclized perfluoro polymer (CPFP), commercialized as CYTOP. Because of its excellent durability for alkalis or acids, the FC film is used for protection of the circuit area of an integrated accelerometer from a silicon alkaline etching process by 25 wt.% TMAH at 90°C. Secondly, FC films are formed on a field-free zone with a capacitive-coupling-type plasma-polymerization equipment using perfluorinated liquids (C7F16, C8F18, etc.) as monomer species. The deposition rates and thermal stability of the films have been investigated. The FC films are effective for elimination of in-use stiction for surface-micromachined devices.

AB - Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. First, FC film is spin-coated from cyclized perfluoro polymer (CPFP), commercialized as CYTOP. Because of its excellent durability for alkalis or acids, the FC film is used for protection of the circuit area of an integrated accelerometer from a silicon alkaline etching process by 25 wt.% TMAH at 90°C. Secondly, FC films are formed on a field-free zone with a capacitive-coupling-type plasma-polymerization equipment using perfluorinated liquids (C7F16, C8F18, etc.) as monomer species. The deposition rates and thermal stability of the films have been investigated. The FC films are effective for elimination of in-use stiction for surface-micromachined devices.

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KW - In-use stiction

KW - Integrated sensors

KW - Plasma polymerization

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A novel deposition technique for fluorocarbon films and its applications for bulk- and surface-micromachined devices

Abstract

Keywords

ASJC Scopus subject areas

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