Abstract
This study presents numerical evidence regarding a new type of self-sustaining mechanism for capacitively-coupled-radiofrequency plasma utilizing a self-consistent relaxation continuum model. The regime's existence depends on an electron source, produced by a detachment reaction from negative ions with high density in the bulk plasma, under a system that the spatiotemporal total rate of electron attachment is greater than that of ionization. That is, a novel mechanism differs markedly from previous ones that radiofrequency plasmas are mainly sustained by the ionization multiplication of low density electrons in a sheath/plasma boundary. The consequences of this finding are discussed from both charge balance and reaction sequence balance in the bulk plasma at 13.56 MHz in oxygen.
Original language | English |
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Pages (from-to) | 4182-4185 |
Number of pages | 4 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 37 |
Issue number | 7 |
DOIs | |
Publication status | Published - 1998 Jul |
Keywords
- Capacitively-coupled-plasma
- Electron attachment
- Electron detachment
- Negative ions
- Novel sustaining mechanism
- Oxygen plasma
- RCT model
- rf plasma
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)