Abstract
Although hydrogen adsorbed on aluminum surfaces is a simple-looking adsorption system, the interaction between them has been found to be very peculiar; that is, a large amount of aluminum hydride molecules such as Al2H6 and/or AlH3 desorb from H/Al(111), while they desorb hardly from H/Al(110). In order to investigate the adsorption states of hydrogen on the two different aluminum surfaces, we have studied these systems by TPD, LEED, and HREELS. Hydrogen atoms adsorb in the island-growth manner on Al(111) at 85 K from the initial stage of adsorption and form a surface aluminum hydride after annealing the surface. The hydrogen adsorption on Al(110) at 85 K exhibits sequential site filling in contrast to H/Al(111) and displays a (1 × 2) reconstruction after annealing.
Original language | English |
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Pages (from-to) | 74-78 |
Number of pages | 5 |
Journal | Surface Science |
Volume | 287-288 |
Issue number | PART 1 |
DOIs | |
Publication status | Published - 1993 May 10 |
Externally published | Yes |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry