(Ba,Sr)TiO3 solid solution thin-films grown by a molecular beam epitaxy method

Tetsuo Kawano, Tetsuhiko Isobe, Mamoru Senna, Takaharu Nishihara, Junzo Tanaka

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)


(Ba,Sr)TiO3 thin films were prepared on SrTiO3 (001) substrates by a molecular beam epitaxy technique. (Ba,Sr)O and TiO2 monolayers were alternately grown in twenty cycles to produce films of 8 nm thick. The growth mechanism of the films was elucidated from reflection high energy electron diffraction and atomic force microscopy. An island growth mechanism was found to be predominant, and activation energies for the surface migration of Sr/Ba and Ti were determined to be 0.31 and 0.33 eV, respectively. According to coaxial impact collision ion scattering spectroscopy measurements, the atomic configuration of the film surface improved when the ratio Sr/Ba increased from Ba0.514Sr0.486TiO3.56 to Ba0.304Sr0.696TiO3.50.

Original languageEnglish
Pages (from-to)57-61
Number of pages5
JournalThin Solid Films
Issue number1-2
Publication statusPublished - 1999 Sept 8


  • Molecular beam epitaxy (MBE), (Ba,Sr)TiO
  • Reflection high energy electron diffraction (RHEED)
  • Surface migration
  • Thin film

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry


Dive into the research topics of '(Ba,Sr)TiO3 solid solution thin-films grown by a molecular beam epitaxy method'. Together they form a unique fingerprint.

Cite this