Comparison of tool feed influence in CNC polishing between a novel Circular-random path and other pseudo-random paths

Ken Takizawa, Anthony Beaucamp

Research output: Contribution to journalArticlepeer-review

32 Citations (Scopus)

Abstract

A new category of circular pseudo-random paths is proposed in order to suppress repetitive patterns and improve surface waviness on ultra-precision polished surfaces. Random paths in prior research had many corners, therefore deceleration of the polishing tool affected the surface waviness. The new random path can suppress velocity changes of the polishing tool and thus restrict degradation of the surface waviness, making it suitable for applications with stringent mid-spatial-frequency requirements such as photomask blanks for EUV lithography.

Original languageEnglish
Pages (from-to)22411-22424
Number of pages14
JournalOptics Express
Volume25
Issue number19
DOIs
Publication statusPublished - 2017 Sept 18
Externally publishedYes

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

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