Diagnostics of an inductively coupled CF4/Ar plasma

Kazuya Hioki; Hajime Hirata; Shosaku Matsumura; Zoran Lj Petrović; Toshiaki Makabe

doi:10.1116/1.582268

Diagnostics of an inductively coupled CF₄/Ar plasma

Kazuya Hioki, Hajime Hirata, Shosaku Matsumura, Zoran Lj Petrović, Toshiaki Makabe

Research output: Contribution to journal › Article › peer-review

37 Citations (Scopus)

Abstract

The properties of a mixture of argon and CF₄ were studied. This mixture is used in plasma etching of SiO₂ and more importantly its properties may be compared to those of the pure argon plasma to observe the effect of CF₄ kinetics, especially the effect of the presence of negative ions. The experimental studies carried out serve as the basis for tests of theoretical models of inductively coupled plasma which are the foundation for computer aided design (CAD) and control of the next generation plasma devices that are being developed.

Original language	English
Pages (from-to)	864-872
Number of pages	9
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	18
Issue number	3
DOIs	https://doi.org/10.1116/1.582268
Publication status	Published - 2000
Externally published	Yes

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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AU - Hioki, Kazuya

AU - Hirata, Hajime

AU - Matsumura, Shosaku

AU - Petrović, Zoran Lj

AU - Makabe, Toshiaki

PY - 2000

Y1 - 2000

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Diagnostics of an inductively coupled CF₄/Ar plasma

Abstract

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