Direct deposition of silica films containing organic groups and dyes from silicon alkoxide solutions

Junrok Oh, Hiroaki Imai, Hiroshi Hirashima, Koji Tsukuma

Research output: Contribution to journalConference articlepeer-review

4 Citations (Scopus)


A new direct-deposition process for silica thin films was developed using silicon alkoxide solutions. Silica thin films incorporating organic groups, such as methyl (CH3) and phenyl (C6H5) groups, were deposited on substrates from aqueous and ethanol solutions of organyltrialkoxysilane. Silica films without organic groups were also formed using ethanol solution of tetraalkoxysilane with aqueous ammonia. Composition of the deposited silica films were influenced by temperature and pH of the solutions and the starting alkoxides. From aqueous solutions containing organyltrialkoxysilane and organic dyes, such as Disperse Red 1 and Rhodamine B, silica films including the dyes were directly prepared on substrates. The composition of silica-organic hybrid films prepared by the deposition method was successfully controlled by selecting the deposition condition and the starting materials.

Original languageEnglish
Pages (from-to)409-414
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Publication statusPublished - 1996
EventProceedings of the 1996 MRS Spring Symposium - San Francisco, CA, USA
Duration: 1996 Apr 81996 Apr 12

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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