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Enhanced Si and B diffusion in semiconductor-grade SiO2 and the effect of strain on diffusion
Masashi Uematsu, Hiroyuki Kageshima, Shigeto Fukatsu, Kohei M. Itoh, Kenji Shiraishi, Minoru Otani, Atsushi Oshiyama
Research output: Contribution to journal › Article › peer-review
8
Citations
(Scopus)