TY - JOUR
T1 - Experimental and numerical analysis of channel-length-dependent electrical properties in bottom-gate, bottom-contact organic thin-film transistors with Schottky contact
AU - Noda, Kei
AU - Wada, Yasuo
AU - Toyabe, Toru
N1 - Funding Information:
A part of this work was conducted at the AIST Nano-Processing Facility, supported by “Nanotechnology Platform Program” of the Ministry of Education, Culture, Sports, Science and Technology, Japan ( MEXT ). This study was partly supported by Joint Research and Development Project of International Standards funded by the Ministry of Economy, Trade and Industry, Japan ( METI ) and Keio Gijyuku Academic Development Funds.
Publisher Copyright:
© 2014 Elsevier B.V. All rights reserved.
PY - 2014/12
Y1 - 2014/12
N2 - Channel length dependence of field-effect mobility and source/drain parasitic resistance in pentacene thin-film transistors with a bottom-gate, bottom-contact configuration was investigated. Schottky barrier effect such as nonlinear behaviors in transistor output characteristics appeared and became more prominent for shorter channel length less than 10 μm, raising some concerns for a simple utilization of conventional parameter extraction methods. Therefore the gate-voltage-dependent hole mobility and the source/drain parasitic resistance in the pentacene transistors were evaluated with the aid of device simulation accounting for Schottky contact with a thermionic field emission model. The hole mobility in the channel region shows smaller values with shorter channel length even after removing the influence of Schottky barrier, suggesting that some disordered semiconductor layers with low carrier mobility exist near the contact electrode. This experimental data analysis with the simulation enables us to discuss and understand in detail the operation mechanism of bottom-gate, bottom-contact transistors by considering properly each process of charge carrier injection, carrier flow near the contact region, and actual channel transport.
AB - Channel length dependence of field-effect mobility and source/drain parasitic resistance in pentacene thin-film transistors with a bottom-gate, bottom-contact configuration was investigated. Schottky barrier effect such as nonlinear behaviors in transistor output characteristics appeared and became more prominent for shorter channel length less than 10 μm, raising some concerns for a simple utilization of conventional parameter extraction methods. Therefore the gate-voltage-dependent hole mobility and the source/drain parasitic resistance in the pentacene transistors were evaluated with the aid of device simulation accounting for Schottky contact with a thermionic field emission model. The hole mobility in the channel region shows smaller values with shorter channel length even after removing the influence of Schottky barrier, suggesting that some disordered semiconductor layers with low carrier mobility exist near the contact electrode. This experimental data analysis with the simulation enables us to discuss and understand in detail the operation mechanism of bottom-gate, bottom-contact transistors by considering properly each process of charge carrier injection, carrier flow near the contact region, and actual channel transport.
KW - Bottom-gate, bottom-contact configuration
KW - Device simulation
KW - Organic thin-film transistors
KW - Schottky barrier
KW - Thermionic field emission
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U2 - 10.1016/j.orgel.2014.10.017
DO - 10.1016/j.orgel.2014.10.017
M3 - Article
AN - SCOPUS:84911431546
SN - 1566-1199
VL - 15
SP - 3681
EP - 3687
JO - Organic Electronics
JF - Organic Electronics
IS - 12
ER -