Abstract
We have observed very large amplitude (≈ 90%) random telegraph signals (RTS) near the pinch-off voltage at very low temperature (1.5 K) in a very narrow, short channel n-MOSFET fabricated by a split-gate technique on an silicon on insulator (SOI) substrate. This large amplitude of RTS can be explained by numerical calculation which takes the potential of the charged trap into account.
Original language | English |
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Pages (from-to) | 858-860 |
Number of pages | 3 |
Journal | Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers |
Volume | 35 |
Issue number | 2 SUPPL. B |
DOIs | |
Publication status | Published - 1996 Feb |
Externally published | Yes |
Keywords
- MOSFET
- Potential fluctuations
- Random telegraph signal
- Single electron trap
- Split-gate
ASJC Scopus subject areas
- Engineering(all)
- Physics and Astronomy(all)