Fabrication of boron doped diamond chip electrodes for single drop analysis

Ai Sugitani; Michinobu Katayama; Takeshi Watanabe; Yoshinori Matsumoto; Yasuaki Einaga

doi:10.1039/c3ra44090g

Fabrication of boron doped diamond chip electrodes for single drop analysis

Ai Sugitani, Michinobu Katayama, Takeshi Watanabe, Yoshinori Matsumoto, Yasuaki Einaga

Research output: Contribution to journal › Article › peer-review

5 Citations (Scopus)

Abstract

As a prototype for a "highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes", a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 μL) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.

Original language	English
Pages (from-to)	25636-25639
Number of pages	4
Journal	RSC Advances
Volume	3
Issue number	48
DOIs	https://doi.org/10.1039/c3ra44090g
Publication status	Published - 2013 Dec 28

ASJC Scopus subject areas

Chemistry(all)
Chemical Engineering(all)

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@article{be2cb167a48443308126d0724ddf1afc,

title = "Fabrication of boron doped diamond chip electrodes for single drop analysis",

abstract = "As a prototype for a {"}highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes{"}, a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 μL) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.",

author = "Ai Sugitani and Michinobu Katayama and Takeshi Watanabe and Yoshinori Matsumoto and Yasuaki Einaga",

year = "2013",

month = dec,

day = "28",

doi = "10.1039/c3ra44090g",

language = "English",

volume = "3",

pages = "25636--25639",

journal = "RSC Advances",

issn = "2046-2069",

publisher = "Royal Society of Chemistry",

number = "48",

}

TY - JOUR

T1 - Fabrication of boron doped diamond chip electrodes for single drop analysis

AU - Sugitani, Ai

AU - Katayama, Michinobu

AU - Watanabe, Takeshi

AU - Matsumoto, Yoshinori

AU - Einaga, Yasuaki

PY - 2013/12/28

Y1 - 2013/12/28

N2 - As a prototype for a "highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes", a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 μL) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.

AB - As a prototype for a "highly sensitive electrochemical detection system for single drop analysis using boron-doped diamond (BDD) electrodes", a three-electrode system for the measurement of samples consisting of a single drop was fabricated. An Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) system, employing the Bosch process in order to realize high-aspect-ratio near vertical structures, was used to etch the BDD. A single drop (10 μL) was analyzed using the resulting fabricated 'BDD chip electrode' which exhibited the typical superior electrochemical properties of BDD electrodes.

UR - http://www.scopus.com/inward/record.url?scp=84887920820&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84887920820&partnerID=8YFLogxK

U2 - 10.1039/c3ra44090g

DO - 10.1039/c3ra44090g

M3 - Article

AN - SCOPUS:84887920820

SN - 2046-2069

VL - 3

SP - 25636

EP - 25639

JO - RSC Advances

JF - RSC Advances

IS - 48

ER -

Fabrication of boron doped diamond chip electrodes for single drop analysis

Abstract

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