Fabrication of valley photonic crystals with CMOS-compatible process

Takuto Yamaguchi, Hironobu Yoshimi, Miyoshi Seki, Minoru Ohtsuka, Nobuyuki Yokoyama, Yasutomo Ota, Makoto Okano, Satoshi Iwamoto

Research output: Chapter in Book/Report/Conference proceedingConference contribution


We demonstrated the fabrication of silicon valley photonic crystal structures with triangular air holes by using photolithography for the first time. The mask patterns we newly designed enable the formation of triangular air holes with reasonably high accuracy. This is an important step toward CMOS-compatible topological nanophotonics.

Original languageEnglish
Title of host publication26th Microoptics Conference, MOC 2021
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9784863487758
Publication statusPublished - 2021
Event26th Microoptics Conference, MOC 2021 - Virtual, Online, Japan
Duration: 2021 Sept 262021 Sept 29

Publication series

Name26th Microoptics Conference, MOC 2021


Conference26th Microoptics Conference, MOC 2021
CityVirtual, Online

ASJC Scopus subject areas

  • Spectroscopy
  • Energy Engineering and Power Technology
  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Atomic and Molecular Physics, and Optics


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