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Growth-Rate-Dependent Properties of GaSb/GaAs Quantum Dots on (001) Ge Substrate by Molecular Beam Epitaxy

  • Zon
  • , Pakawat Phienlumlert
  • , Supachok Thainoi
  • , Suwit Kiravittaya
  • , Aniwat Tandaechanurat
  • , Noppadon Nuntawong
  • , Suwat Sopitpan
  • , Visittapong Yordsri
  • , Chanchana Thanachayanont
  • , Songphol Kanjanachuchai
  • , Somchai Ratanathammaphan
  • , Somsak Panyakeow
  • , Yasutomo Ota
  • , Satoshi Iwamoto
  • , Yasuhiko Arakawa

Research output: Contribution to journal › Article › peer-review

Abstract

Tuning growth of nanostructures can provide additional routes to engineer their characteristics. In this work, the authors report on a combined growth of GaSb/GaAs quantum dots (QDs) and growth of GaAs on (001) Ge substrate. Surface decorated with GaAs anti-phase domain is the initial template to investigate the growth-rate effects on the growth of self-assembled GaSb QDs. By varying the GaSb growth rates, QD ensembles with different morphologies are formed. Perpendicular alignment of elongated GaSb QDs is observed. Cross-sectional transmission electron microscopic images show a substantial reduction of lateral QD size when it is buried in GaAs matrix. Raman scattering as well as power-dependent photoluminescence spectroscopies are performed to reveal the optical properties of the nanostructures. Type-II band alignment characteristic is confirmed.

Original languageEnglish
Article number1800499
JournalPhysica Status Solidi (A) Applications and Materials Science
Volume216
Issue number1
DOIs
Publication statusPublished - 2019 Jan 9
Externally publishedYes

Keywords

  • GaSb/GaAs
  • Ge substrate
  • molecular beam epitaxy
  • quantum dots

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering
  • Materials Chemistry

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