Hardness and surface roughness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure-plasma enhanced chemical vapor deposition at low temperature

Mayui Noborisaka; Ryohei Horikoshi; So Nagashima; Akira Shirakura; Tetsuya Suzuki

doi:10.1016/j.tsf.2012.11.065

Hardness and surface roughness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure-plasma enhanced chemical vapor deposition at low temperature

Mayui Noborisaka, Ryohei Horikoshi, So Nagashima, Akira Shirakura, Tetsuya Suzuki

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

11 Citations (Scopus)

Abstract

Hydrogenated amorphous carbon (a-C:H)-based films were synthesized by the dielectric barrier discharge-based plasma deposition at atmospheric pressure from C₂H₂ diluted with He or N₂ gas with varying dilution ratios (R) and their hardness, surface roughness and chemical composition were analyzed. The films deposited from C₂H ₂/N₂ contained nitrogen elements and they were softer with rougher surface compared with the a-C:H films deposited from C ₂H₂/He. Additionally the amount of nitrogen incorporation increased as the ratio R decreased, which led to deterioration of hardness and surface smoothness. As for C₂H₂/He, the film hardness slightly increased by decreasing the ratio R and the a-C:H (R = 1%) showed a maximum hardness of 1.1 GPa.

Original language	English
Pages (from-to)	114-119
Number of pages	6
Journal	Thin Solid Films
Volume	527
DOIs	https://doi.org/10.1016/j.tsf.2012.11.065
Publication status	Published - 2013 Jan 1

Keywords

Atmospheric pressure plasma-enhanced chemical vapor deposition
Dilution gas
Hydrogenated amorphous carbon
Keywords
Low temperature
Surface roughness
Thin films

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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@article{678974ce75b2434ba315ee3fd6ab5323,

title = "Hardness and surface roughness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure-plasma enhanced chemical vapor deposition at low temperature",

abstract = "Hydrogenated amorphous carbon (a-C:H)-based films were synthesized by the dielectric barrier discharge-based plasma deposition at atmospheric pressure from C2H2 diluted with He or N2 gas with varying dilution ratios (R) and their hardness, surface roughness and chemical composition were analyzed. The films deposited from C2H 2/N2 contained nitrogen elements and they were softer with rougher surface compared with the a-C:H films deposited from C 2H2/He. Additionally the amount of nitrogen incorporation increased as the ratio R decreased, which led to deterioration of hardness and surface smoothness. As for C2H2/He, the film hardness slightly increased by decreasing the ratio R and the a-C:H (R = 1%) showed a maximum hardness of 1.1 GPa.",

keywords = "Atmospheric pressure plasma-enhanced chemical vapor deposition, Dilution gas, Hydrogenated amorphous carbon, Keywords, Low temperature, Surface roughness, Thin films",

author = "Mayui Noborisaka and Ryohei Horikoshi and So Nagashima and Akira Shirakura and Tetsuya Suzuki",

note = "Funding Information: A part of this work was supported by “Nanotechnology Platform” of the Ministry of Education, Culture, Sports, Science and Technology (MEXT) , Japan.",

year = "2013",

month = jan,

day = "1",

doi = "10.1016/j.tsf.2012.11.065",

language = "English",

volume = "527",

pages = "114--119",

journal = "Thin Solid Films",

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TY - JOUR

T1 - Hardness and surface roughness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure-plasma enhanced chemical vapor deposition at low temperature

AU - Noborisaka, Mayui

AU - Horikoshi, Ryohei

AU - Nagashima, So

AU - Shirakura, Akira

AU - Suzuki, Tetsuya

N1 - Funding Information: A part of this work was supported by “Nanotechnology Platform” of the Ministry of Education, Culture, Sports, Science and Technology (MEXT) , Japan.

PY - 2013/1/1

Y1 - 2013/1/1

N2 - Hydrogenated amorphous carbon (a-C:H)-based films were synthesized by the dielectric barrier discharge-based plasma deposition at atmospheric pressure from C2H2 diluted with He or N2 gas with varying dilution ratios (R) and their hardness, surface roughness and chemical composition were analyzed. The films deposited from C2H 2/N2 contained nitrogen elements and they were softer with rougher surface compared with the a-C:H films deposited from C 2H2/He. Additionally the amount of nitrogen incorporation increased as the ratio R decreased, which led to deterioration of hardness and surface smoothness. As for C2H2/He, the film hardness slightly increased by decreasing the ratio R and the a-C:H (R = 1%) showed a maximum hardness of 1.1 GPa.

AB - Hydrogenated amorphous carbon (a-C:H)-based films were synthesized by the dielectric barrier discharge-based plasma deposition at atmospheric pressure from C2H2 diluted with He or N2 gas with varying dilution ratios (R) and their hardness, surface roughness and chemical composition were analyzed. The films deposited from C2H 2/N2 contained nitrogen elements and they were softer with rougher surface compared with the a-C:H films deposited from C 2H2/He. Additionally the amount of nitrogen incorporation increased as the ratio R decreased, which led to deterioration of hardness and surface smoothness. As for C2H2/He, the film hardness slightly increased by decreasing the ratio R and the a-C:H (R = 1%) showed a maximum hardness of 1.1 GPa.

KW - Atmospheric pressure plasma-enhanced chemical vapor deposition

KW - Dilution gas

KW - Hydrogenated amorphous carbon

KW - Keywords

KW - Low temperature

KW - Surface roughness

KW - Thin films

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U2 - 10.1016/j.tsf.2012.11.065

DO - 10.1016/j.tsf.2012.11.065

M3 - Article

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SN - 0040-6090

VL - 527

SP - 114

EP - 119

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Hardness and surface roughness of hydrogenated amorphous carbon-based films synthesized by atmospheric pressure-plasma enhanced chemical vapor deposition at low temperature

Abstract

Keywords

ASJC Scopus subject areas

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