Impact of Deformation potential increase at Si/SiO2 interfaces on stress-induced electron mobility enhancement in metal-oxide-semiconductor field-effect transistors

Teruyuki Ohashi, Shunri Oda, Ken Uchida

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

The impact of deformation potential increase at metal-oxide-semiconductor (MOS) interfaces on stress effects is thoroughly studied. In our previous study, we revealed that the deformation potential (Dac) of Si increases at MOS interfaces. The energy split between two-and four-fold valleys is proportional to Dac. Therefore, it is considered that the Dac increase at MOS interfaces has an affect on strain effects. Dac effectively changes by adjusting Si-on-insulator (SOI) thickness and carrier distribution at MOS interfaces. Therefore, the SOI thickness dependence and carrier distribution dependence of electron mobility enhancement ratio (μe/μe) under strain are investigated. Experimental results are explained by the model including the Dac increase at MOS interfaces. In addition, experimental data are well reproduced by calculation using the positiondependent-Dac model. By applying uniaxial strain, effective mass, subband occupation, and intervalley scattering rate are also changed. Their effects on e=e are also discussed in this paper.

Original languageEnglish
Article number04CC12
JournalJapanese journal of applied physics
Volume52
Issue number4 PART 2
DOIs
Publication statusPublished - 2013 Apr
Externally publishedYes

ASJC Scopus subject areas

  • General Engineering
  • General Physics and Astronomy

Fingerprint

Dive into the research topics of 'Impact of Deformation potential increase at Si/SiO2 interfaces on stress-induced electron mobility enhancement in metal-oxide-semiconductor field-effect transistors'. Together they form a unique fingerprint.

Cite this