Abstract
Ambient pressure X-ray photoelectron spectroscopy (AP-XPS) has been applied to the investigation of NO adsorption on Pt(111) under various pressures of NO (up to 1 Torr) at room temperature. Under 10-7 Torr, molecular NO occupies the most stable fcc-hollow sites and partially occupies the energetically unfavorable atop sites. NO reversibly desorbs from the atop sites after evacuation. At NO pressures higher than 10-6 Torr, however, irreversible adsorption of atomic oxygen takes place via NO dissociation, leading to the formation of NO+O domains. This result is consistent with near-edge X-ray absorption fine structure (NEXAFS) and scanning tunneling microscopy (STM) results.
Original language | English |
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Pages (from-to) | 17030-17035 |
Number of pages | 6 |
Journal | Journal of Physical Chemistry C |
Volume | 114 |
Issue number | 40 |
DOIs | |
Publication status | Published - 2010 Oct 14 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- General Energy
- Physical and Theoretical Chemistry
- Surfaces, Coatings and Films