Laser ablation deposition of crystalline copper-phthalocyanine thin films

E. Ina; N. Matsumoto; E. Shikada; F. Kannari

doi:10.1016/S0169-4332(97)00708-3

Laser ablation deposition of crystalline copper-phthalocyanine thin films

E. Ina, N. Matsumoto, E. Shikada, F. Kannari

Department of Electronics and Electrical Engineering

Research output: Contribution to journal › Article › peer-review

26 Citations (Scopus)

Abstract

The poor crystallinity of copper-phthalocyanine (CuPc) thin films fabricated via KrF laser ablation is significantly improved by three different assisting methods applied during deposition: (1) elevating substrate temperature only up to 50°C; (2) irradiating with HeNe laser of ∼ 200 μW/cm ² ; (3) applying DC electric field. Highest crystallinity is obtained when the film is deposited under DC electric field of ∼ 50 V/cm in the direction of film thickness. This in-process electric poling also works for 4-dialkylamino-4′-nitrostilbensen (DANS) film.

Original language	English
Pages (from-to)	574-578
Number of pages	5
Journal	Applied Surface Science
Volume	127-129
DOIs	https://doi.org/10.1016/S0169-4332(97)00708-3
Publication status	Published - 1998 May

Keywords

Copper-phthalocyanine
Electric poling
Laser ablation deposition
Organic thin films

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1016/S0169-4332(97)00708-3

Cite this

@article{b22a51550126467294de0401b324cbe1,

title = "Laser ablation deposition of crystalline copper-phthalocyanine thin films",

abstract = " The poor crystallinity of copper-phthalocyanine (CuPc) thin films fabricated via KrF laser ablation is significantly improved by three different assisting methods applied during deposition: (1) elevating substrate temperature only up to 50°C; (2) irradiating with HeNe laser of ∼ 200 μW/cm 2 ; (3) applying DC electric field. Highest crystallinity is obtained when the film is deposited under DC electric field of ∼ 50 V/cm in the direction of film thickness. This in-process electric poling also works for 4-dialkylamino-4′-nitrostilbensen (DANS) film.",

keywords = "Copper-phthalocyanine, Electric poling, Laser ablation deposition, Organic thin films",

author = "E. Ina and N. Matsumoto and E. Shikada and F. Kannari",

note = "Funding Information: This study was partially supported by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture of Japan.",

year = "1998",

month = may,

doi = "10.1016/S0169-4332(97)00708-3",

language = "English",

volume = "127-129",

pages = "574--578",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier",

}

TY - JOUR

T1 - Laser ablation deposition of crystalline copper-phthalocyanine thin films

AU - Ina, E.

AU - Matsumoto, N.

AU - Shikada, E.

AU - Kannari, F.

N1 - Funding Information: This study was partially supported by a Grant-in-Aid for Scientific Research from the Ministry of Education, Science and Culture of Japan.

PY - 1998/5

Y1 - 1998/5

N2 - The poor crystallinity of copper-phthalocyanine (CuPc) thin films fabricated via KrF laser ablation is significantly improved by three different assisting methods applied during deposition: (1) elevating substrate temperature only up to 50°C; (2) irradiating with HeNe laser of ∼ 200 μW/cm 2 ; (3) applying DC electric field. Highest crystallinity is obtained when the film is deposited under DC electric field of ∼ 50 V/cm in the direction of film thickness. This in-process electric poling also works for 4-dialkylamino-4′-nitrostilbensen (DANS) film.

AB - The poor crystallinity of copper-phthalocyanine (CuPc) thin films fabricated via KrF laser ablation is significantly improved by three different assisting methods applied during deposition: (1) elevating substrate temperature only up to 50°C; (2) irradiating with HeNe laser of ∼ 200 μW/cm 2 ; (3) applying DC electric field. Highest crystallinity is obtained when the film is deposited under DC electric field of ∼ 50 V/cm in the direction of film thickness. This in-process electric poling also works for 4-dialkylamino-4′-nitrostilbensen (DANS) film.

KW - Copper-phthalocyanine

KW - Electric poling

KW - Laser ablation deposition

KW - Organic thin films

UR - http://www.scopus.com/inward/record.url?scp=0032074106&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0032074106&partnerID=8YFLogxK

U2 - 10.1016/S0169-4332(97)00708-3

DO - 10.1016/S0169-4332(97)00708-3

M3 - Article

AN - SCOPUS:0032074106

SN - 0169-4332

VL - 127-129

SP - 574

EP - 578

JO - Applied Surface Science

JF - Applied Surface Science

ER -

Laser ablation deposition of crystalline copper-phthalocyanine thin films

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this