Liquid-immersion inclined UV lithography using cube prism and mirrors

Gakuto Kagawa, Takumi Sugimoto, Hidetoshi Takahashi

Research output: Contribution to journalArticlepeer-review


This paper reports on the inclined UV lithography based on liquid immersion. The proposed method implements liquid immersion, allowing structures to be formed with a large inclination angle. The equipment comprises two adjustable mirrors and a cubic glass with a pure water chamber. UV light rays are reflected and passed through the mirrors and chamber, irradiating the target at an inclined angle. We developed the necessary equipment and fabricated the 3D microstructures. The results revealed that the inclination angle reached up to 49°, indicating exposures beyond the limits of conventional inclined UV lithography.

Original languageEnglish
Article number116501
JournalApplied Physics Express
Issue number11
Publication statusPublished - 2022 Nov


  • MEMS
  • inclined UV lithography
  • liquid immersion

ASJC Scopus subject areas

  • General Engineering
  • General Physics and Astronomy


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