Abstract
We perform simulations of the magnetron plasma under a strong magnetic field as well as the conventional magnetic field in the cylindrical geometry in order to examine the typical plasma structure of the magnetron with a strong magnetic field. In the case of the strong magnetic field, an electric field is formed even in the outside region of the sheath. Because the electron diffusion is strongly suppressed by the strong magnetic field, the electron diffusion to the anode is enforced by the electric field in the outside region of the sheath in order to sustain the plasma. Due to the additional electric field, the distributions of the net generation rate and the number density of the plasma are broadened to the anode direction.
| Original language | English |
|---|---|
| Pages (from-to) | 27-31 |
| Number of pages | 5 |
| Journal | Thin Solid Films |
| Volume | 442 |
| Issue number | 1-2 |
| DOIs | |
| Publication status | Published - 2003 Oct 1 |
| Event | Selected Papers from the 4th International COnference on Coating - Braunschweig, Germany Duration: 2002 Nov 3 → 2002 Nov 7 |
Keywords
- Computer simulation
- Glow discharge
- Plasma processing and depostition
- Sputtering
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry