Mechanism of mid-spatial-frequency waviness removal by viscoelastic polishing tool

Wu Le Zhu, Oliver Pakenham-Walsh, Kathryn Copson, Phillip Charlton, Kazuya Tatsumi, Bing Feng Ju, Anthony Beaucamp

Research output: Contribution to journalArticlepeer-review

4 Citations (Scopus)

Abstract

Nanoscale roughness with ultra-precise form control can be readily achieved using compliant finishing methods such as bonnet polishing. However, their weak point lies in the difficulty of removing mid-spatial-frequency (MSF) waviness in the typical range from 0.1 to 5.0 mm wavelength. To overcome this shortcoming, a bonnet tool filled with viscoelastic fluid is developed and a comprehensive model is established to disclose its distinct removal behavior in the MSF range. The model considers tool viscoelasticity, stress distribution and workpiece topography. Experiments show high consistency with theoretical predictions, and show that MSF waviness can be effectively reduced using the proposed method.

Original languageEnglish
Pages (from-to)269-272
Number of pages4
JournalCIRP Annals
Volume71
Issue number1
DOIs
Publication statusPublished - 2022 Jan
Externally publishedYes

Keywords

  • Mid-spatial-frequency error
  • Polishing
  • Ultra precision

ASJC Scopus subject areas

  • Mechanical Engineering
  • Industrial and Manufacturing Engineering

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