Microhardness and lattice parameter of Cr1-xAlxN films

Masahiro Kawate; Ayako Kimura; Tetsuya Suzuki

doi:10.1116/1.1448510

Microhardness and lattice parameter of Cr_1-xAl_xN films

Masahiro Kawate, Ayako Kimura, Tetsuya Suzuki

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

114 Citations (Scopus)

Abstract

Eight kinds of targets with differing Al contents were used to synthesize Cr_1-xAl_xN films by the arc ion plating (AIP) method. Investigation of microhardness, microstructures, and lattice parameters of films was done by changing x values and analyzed by x-ray diffraction (XRD) method and scanning electron microscopy (SEM). Cross-sectional SEM observation of films showed that for all Cr_1-xAl_xN films, deposited for 20 min, microstructure drastically changed between x = 0.6 and 0.7, and had similar thickness of 5 to 6 μm.

Original language	English
Pages (from-to)	569-571
Number of pages	3
Journal	Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume	20
Issue number	2
DOIs	https://doi.org/10.1116/1.1448510
Publication status	Published - 2002 Mar

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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Microhardness and lattice parameter of Cr_1-xAl_xN films

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