Fingerprint
Dive into the research topics of 'Modeling of N2-H2 capacitively coupled plasma for low-k material etching'. Together they form a unique fingerprint.- Sort by
- Weight
- Alphabetically
Modeling of N2-H2 capacitively coupled plasma for low-k material etching
Chae Hwa Shon, Toshiaki Makabe
Research output: Contribution to journal › Article › peer-review
20
Citations
(Scopus)