MR measurement of sub-micron scale relief structures fabricated in GMR materials

K. Matsuyama, Y. Nozaki, T. Misumi

Research output: Contribution to journalConference articlepeer-review

2 Citations (Scopus)


Understanding of magnetization process in patterned thin films is important for their applications in downsizing various magnetic devices. This paper deals with an experimental technique which enables us to characterize magnetization process in the ends of patterned ultra-thin films. In this study, only the top layer of magnetic sandwich structures were patterned into an array of fine magnetic particles using electron beam lithography and Ar ion milling to form relief structures in the films. The magnetization process of the arrays was inferred from magnetoresistance (MR) measurements of the films. MR behaviors of particle array samples of substrate/FM1/Cu/FM2 (FM1, FM2 = Co, NiFe, CoPt) in different pattern widths of ω = 0.2 and 0.6 μm, lengths L ranging from 0.2 to 280 μm and thicknesses of t = 6 and 18 nm were studied. From longitudinal MR measurements, a distinct decrease in remanent magnetization was found for sub-μm particle arrays, which may be associated with the formation of edge domains in the particles.

Original languageEnglish
Pages (from-to)2114-2116
Number of pages3
JournalIEEE Transactions on Magnetics
Issue number4 I
Publication statusPublished - 2001 Jul
Externally publishedYes
Event8th Joint Magnetism and Magnetic Materials -International Magnetic Conference- (MMM-Intermag) - San Antonio, TX, United States
Duration: 2001 Jan 72001 Jan 11


  • EB lithography
  • Magnetic domain
  • Magnetization reversal
  • Spin valve

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering


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