Numerical investigation of relationship between micro-scale pattern, interfacial plasma structure and feature profile during deep-Si etching in two-frequency capacitively coupled plasmas in SF6/O2

Fukutaro Hamaoka, Takashi Yagisawa, Toshiaki Makabe

Research output: Contribution to journal › Article › peer-review

10 Citations (Scopus)

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Engineering & Materials Science

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Chemical Compounds