Oxygen atom density in rare gas diluted O2 radio frequency plasma

Takeshi Kitajima; Junta Nakashima; Toshiki Nakano; Toshiaki Makabe

doi:10.1016/j.tsf.2005.08.091

Oxygen atom density in rare gas diluted O₂ radio frequency plasma

Takeshi Kitajima, Junta Nakashima, Toshiki Nakano, Toshiaki Makabe

Vice-President

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

The influence of rare gas dilution on absolute oxygen atom density in O₂ radio frequency (RF) capacitively coupled plasma (CCP) was investigated by vacuum ultraviolet absorption spectroscopy (VUVAS) with pulse modulation of main plasma. Helium dilution is effective for raising O atom density at high total pressure (5 Torr) due to the Penning ionization by metastable He. Argon and Krypton dilution keeps O atom density same to pure O₂ case at 0.5 Torr while helium dilution lowers the O atom density by the enhanced diffusion flux of O atoms toward walls. The trend is supported by a diffusion model of O atoms.

Original language	English
Pages (from-to)	489-493
Number of pages	5
Journal	Thin Solid Films
Volume	506-507
DOIs	https://doi.org/10.1016/j.tsf.2005.08.091
Publication status	Published - 2006 May 26

Keywords

169 Glow discharge
346 Optical spectroscopy
355 Oxygen
373 Plasma processing and deposition

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/j.tsf.2005.08.091

Cite this

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title = "Oxygen atom density in rare gas diluted O2 radio frequency plasma",

abstract = "The influence of rare gas dilution on absolute oxygen atom density in O2 radio frequency (RF) capacitively coupled plasma (CCP) was investigated by vacuum ultraviolet absorption spectroscopy (VUVAS) with pulse modulation of main plasma. Helium dilution is effective for raising O atom density at high total pressure (5 Torr) due to the Penning ionization by metastable He. Argon and Krypton dilution keeps O atom density same to pure O2 case at 0.5 Torr while helium dilution lowers the O atom density by the enhanced diffusion flux of O atoms toward walls. The trend is supported by a diffusion model of O atoms.",

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author = "Takeshi Kitajima and Junta Nakashima and Toshiki Nakano and Toshiaki Makabe",

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doi = "10.1016/j.tsf.2005.08.091",

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T1 - Oxygen atom density in rare gas diluted O2 radio frequency plasma

AU - Kitajima, Takeshi

AU - Nakashima, Junta

AU - Nakano, Toshiki

AU - Makabe, Toshiaki

PY - 2006/5/26

Y1 - 2006/5/26

N2 - The influence of rare gas dilution on absolute oxygen atom density in O2 radio frequency (RF) capacitively coupled plasma (CCP) was investigated by vacuum ultraviolet absorption spectroscopy (VUVAS) with pulse modulation of main plasma. Helium dilution is effective for raising O atom density at high total pressure (5 Torr) due to the Penning ionization by metastable He. Argon and Krypton dilution keeps O atom density same to pure O2 case at 0.5 Torr while helium dilution lowers the O atom density by the enhanced diffusion flux of O atoms toward walls. The trend is supported by a diffusion model of O atoms.

AB - The influence of rare gas dilution on absolute oxygen atom density in O2 radio frequency (RF) capacitively coupled plasma (CCP) was investigated by vacuum ultraviolet absorption spectroscopy (VUVAS) with pulse modulation of main plasma. Helium dilution is effective for raising O atom density at high total pressure (5 Torr) due to the Penning ionization by metastable He. Argon and Krypton dilution keeps O atom density same to pure O2 case at 0.5 Torr while helium dilution lowers the O atom density by the enhanced diffusion flux of O atoms toward walls. The trend is supported by a diffusion model of O atoms.

KW - 169 Glow discharge

KW - 346 Optical spectroscopy

KW - 355 Oxygen

KW - 373 Plasma processing and deposition

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DO - 10.1016/j.tsf.2005.08.091

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JO - Thin Solid Films

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