Abstract
We observed UV-stimulated hydroxylation at the surface of ZnO crystals. Reactive defective sites were initially formed in the surface layer via photoreduction induced with energetic photons above the band gap of ZnO. Hydroxyl groups were produced by a chemical reaction of the photoinduced defective sites with water molecules in the atmosphere. Two types of hydroxyl groups were found at the irradiated surface because two kinds of defective sites were induced with the UV illumination.
Original language | English |
---|---|
Pages (from-to) | 284-287 |
Number of pages | 4 |
Journal | Thin Solid Films |
Volume | 445 |
Issue number | 2 |
DOIs | |
Publication status | Published - 2003 Dec 15 |
Event | Proceedings of the 3rd International Symposium on Transparent Oxide - Tokyo, Japan Duration: 2003 Apr 10 → 2003 Apr 11 |
Keywords
- Hydroxylation
- Photoreduction
- Surface
- Ultraviolet
- ZnO
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry