CuInSe2(CIS) films have been grown by molecular beam epitaxy on pseudo lattice-matched substrates which consist of a 1μm-thick In0.29Ga0.71 As layer grown on (001)-oriented GaAs substrates interposed with a linearly composition-graded In xGa1-xAs buffer (0≤x≤0.29), and have been characterized in comparison with the films grown directly on GaAs (001). High resolution X-ray diffraction analysis on CIS grown on pseudo lattice-matched substrates indicated the reduction of residual strain in the CIS films. Sharp free exciton emissions have been predominantly observed for the first time from the CIS films indicative of significant improvement in crystalline quality and of reduction of point defects. It also suggests that the misfit strain plays an important role in the formation of point defects in CIS epitaxial films.
|Journal||Denshi Gijutsu Sogo Kenkyusho Iho/Bulletin of the Electrotechnical Laboratory|
|Publication status||Published - 1996|
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering