Self-focusing 3D lithography with varying refractive index polyethylene glycol diacrylate

Hidetoshi Takahashi; Tetsuo Kan; Gayeong Lee; Nilsu Dönmez; Jieun Kim; Jihoon Park; Dongwook Kim; Yun Jung Heo

doi:10.35848/1882-0786/ab9ba3

Self-focusing 3D lithography with varying refractive index polyethylene glycol diacrylate

Hidetoshi Takahashi, Tetsuo Kan, Gayeong Lee, Nilsu Dönmez, Jieun Kim, Jihoon Park, Dongwook Kim, Yun Jung Heo

Department of Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

9 Citations (Scopus)

Abstract

This work presents self-focusing 3D lithography based on the refractive index changes of polyethylene glycol diacrylate (PEGDA) during photopolymerization. Since the polymerization of PEGDA leads to an increase in the refractive index, the UV light rays in the PEGDA undergo a refraction effect during exposure, thus being focused and forming 3D photopolymerized structures. We demonstrate the potential of self-focusing 3D lithography by fabricating PEGDA microneedles and trapezoid-shaped microwells. Their structures well match our theoretical estimation. Therefore, our theoretical approach can provide a short route to realizing on-demand, complicated 3D structures of refractive-index-variable materials with single UV exposure.

Original language	English
Article number	076503
Journal	Applied Physics Express
Volume	13
Issue number	7
DOIs	https://doi.org/10.35848/1882-0786/ab9ba3
Publication status	Published - 2020 Jul 1

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy(all)

Access to Document

10.35848/1882-0786/ab9ba3

Cite this

@article{37d3d6992a2f46089ea6c74991492466,

title = "Self-focusing 3D lithography with varying refractive index polyethylene glycol diacrylate",

abstract = "This work presents self-focusing 3D lithography based on the refractive index changes of polyethylene glycol diacrylate (PEGDA) during photopolymerization. Since the polymerization of PEGDA leads to an increase in the refractive index, the UV light rays in the PEGDA undergo a refraction effect during exposure, thus being focused and forming 3D photopolymerized structures. We demonstrate the potential of self-focusing 3D lithography by fabricating PEGDA microneedles and trapezoid-shaped microwells. Their structures well match our theoretical estimation. Therefore, our theoretical approach can provide a short route to realizing on-demand, complicated 3D structures of refractive-index-variable materials with single UV exposure.",

author = "Hidetoshi Takahashi and Tetsuo Kan and Gayeong Lee and Nilsu D{\"o}nmez and Jieun Kim and Jihoon Park and Dongwook Kim and Heo, {Yun Jung}",

note = "Publisher Copyright: {\textcopyright} 2020 The Japan Society of Applied Physics.",

year = "2020",

month = jul,

day = "1",

doi = "10.35848/1882-0786/ab9ba3",

language = "English",

volume = "13",

journal = "Applied Physics Express",

issn = "1882-0778",

publisher = "Japan Society of Applied Physics",

number = "7",

}

TY - JOUR

T1 - Self-focusing 3D lithography with varying refractive index polyethylene glycol diacrylate

AU - Takahashi, Hidetoshi

AU - Kan, Tetsuo

AU - Lee, Gayeong

AU - Dönmez, Nilsu

AU - Kim, Jieun

AU - Park, Jihoon

AU - Kim, Dongwook

AU - Heo, Yun Jung

PY - 2020/7/1

Y1 - 2020/7/1

N2 - This work presents self-focusing 3D lithography based on the refractive index changes of polyethylene glycol diacrylate (PEGDA) during photopolymerization. Since the polymerization of PEGDA leads to an increase in the refractive index, the UV light rays in the PEGDA undergo a refraction effect during exposure, thus being focused and forming 3D photopolymerized structures. We demonstrate the potential of self-focusing 3D lithography by fabricating PEGDA microneedles and trapezoid-shaped microwells. Their structures well match our theoretical estimation. Therefore, our theoretical approach can provide a short route to realizing on-demand, complicated 3D structures of refractive-index-variable materials with single UV exposure.

AB - This work presents self-focusing 3D lithography based on the refractive index changes of polyethylene glycol diacrylate (PEGDA) during photopolymerization. Since the polymerization of PEGDA leads to an increase in the refractive index, the UV light rays in the PEGDA undergo a refraction effect during exposure, thus being focused and forming 3D photopolymerized structures. We demonstrate the potential of self-focusing 3D lithography by fabricating PEGDA microneedles and trapezoid-shaped microwells. Their structures well match our theoretical estimation. Therefore, our theoretical approach can provide a short route to realizing on-demand, complicated 3D structures of refractive-index-variable materials with single UV exposure.

UR - http://www.scopus.com/inward/record.url?scp=85091399956&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85091399956&partnerID=8YFLogxK

U2 - 10.35848/1882-0786/ab9ba3

DO - 10.35848/1882-0786/ab9ba3

M3 - Article

AN - SCOPUS:85091399956

SN - 1882-0778

VL - 13

JO - Applied Physics Express

JF - Applied Physics Express

IS - 7

M1 - 076503

ER -

Self-focusing 3D lithography with varying refractive index polyethylene glycol diacrylate

Abstract

ASJC Scopus subject areas

Access to Document

Other files and links

Fingerprint

Cite this