Significance of the interface regarding magnetic properties of manganese nanosilicide in silicon

Y. Ono; Y. Miyazaki; S. Yabuuchi; H. Kageshima; M. Nagase; A. Fujiwara; E. Ohta

doi:10.1016/j.tsf.2011.05.027

Significance of the interface regarding magnetic properties of manganese nanosilicide in silicon

Y. Ono, Y. Miyazaki, S. Yabuuchi, H. Kageshima, M. Nagase, A. Fujiwara, E. Ohta

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Magnetic properties of manganese (Mn) nanosilicide embedded in thin silicon-on-insulator (SOI) layers are investigated. Mn nanosilicide formed by Mn⁺ ion implantation into a thin SOI layer followed by a thermal annealing at 600-900 °C shows soft ferromagnetism or superparamagnetism at 5 K. A monotonic decrease of the saturation magnetization is observed with increasing temperature for post implantation annealing and consequently with increasing mean particle size of nanosilicide. In addition, the magnetization is found to be enhanced when the Si surrounding the Mn nanosilicide is selectively removed. These results indicate that the magnetic moment indeed arises from the nanosilicide and is sensitive to the interface conditions.

Original language	English
Pages (from-to)	8505-8508
Number of pages	4
Journal	Thin Solid Films
Volume	519
Issue number	24
DOIs	https://doi.org/10.1016/j.tsf.2011.05.027
Publication status	Published - 2011 Oct 3
Externally published	Yes

Keywords

Ferromagnetism
Manganese
Nanostructure
Silicide
Silicon
Spintronics

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

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title = "Significance of the interface regarding magnetic properties of manganese nanosilicide in silicon",

abstract = "Magnetic properties of manganese (Mn) nanosilicide embedded in thin silicon-on-insulator (SOI) layers are investigated. Mn nanosilicide formed by Mn+ ion implantation into a thin SOI layer followed by a thermal annealing at 600-900 °C shows soft ferromagnetism or superparamagnetism at 5 K. A monotonic decrease of the saturation magnetization is observed with increasing temperature for post implantation annealing and consequently with increasing mean particle size of nanosilicide. In addition, the magnetization is found to be enhanced when the Si surrounding the Mn nanosilicide is selectively removed. These results indicate that the magnetic moment indeed arises from the nanosilicide and is sensitive to the interface conditions.",

keywords = "Ferromagnetism, Manganese, Nanostructure, Silicide, Silicon, Spintronics",

author = "Y. Ono and Y. Miyazaki and S. Yabuuchi and H. Kageshima and M. Nagase and A. Fujiwara and E. Ohta",

note = "Funding Information: This work was partly supported by KAKENHI ( 20241036 ).",

year = "2011",

month = oct,

day = "3",

doi = "10.1016/j.tsf.2011.05.027",

language = "English",

volume = "519",

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journal = "Thin Solid Films",

issn = "0040-6090",

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T1 - Significance of the interface regarding magnetic properties of manganese nanosilicide in silicon

AU - Ono, Y.

AU - Miyazaki, Y.

AU - Yabuuchi, S.

AU - Kageshima, H.

AU - Nagase, M.

AU - Fujiwara, A.

AU - Ohta, E.

N1 - Funding Information: This work was partly supported by KAKENHI ( 20241036 ).

PY - 2011/10/3

Y1 - 2011/10/3

N2 - Magnetic properties of manganese (Mn) nanosilicide embedded in thin silicon-on-insulator (SOI) layers are investigated. Mn nanosilicide formed by Mn+ ion implantation into a thin SOI layer followed by a thermal annealing at 600-900 °C shows soft ferromagnetism or superparamagnetism at 5 K. A monotonic decrease of the saturation magnetization is observed with increasing temperature for post implantation annealing and consequently with increasing mean particle size of nanosilicide. In addition, the magnetization is found to be enhanced when the Si surrounding the Mn nanosilicide is selectively removed. These results indicate that the magnetic moment indeed arises from the nanosilicide and is sensitive to the interface conditions.

AB - Magnetic properties of manganese (Mn) nanosilicide embedded in thin silicon-on-insulator (SOI) layers are investigated. Mn nanosilicide formed by Mn+ ion implantation into a thin SOI layer followed by a thermal annealing at 600-900 °C shows soft ferromagnetism or superparamagnetism at 5 K. A monotonic decrease of the saturation magnetization is observed with increasing temperature for post implantation annealing and consequently with increasing mean particle size of nanosilicide. In addition, the magnetization is found to be enhanced when the Si surrounding the Mn nanosilicide is selectively removed. These results indicate that the magnetic moment indeed arises from the nanosilicide and is sensitive to the interface conditions.

KW - Ferromagnetism

KW - Manganese

KW - Nanostructure

KW - Silicide

KW - Silicon

KW - Spintronics

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DO - 10.1016/j.tsf.2011.05.027

M3 - Article

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SN - 0040-6090

VL - 519

SP - 8505

EP - 8508

JO - Thin Solid Films

JF - Thin Solid Films

IS - 24

ER -

Significance of the interface regarding magnetic properties of manganese nanosilicide in silicon

Abstract

Keywords

ASJC Scopus subject areas

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