TY - GEN
T1 - Simulation of refractive index profile formed in polymer optical waveguides fabricated using the Mosquito method
AU - Sakaguchi, Yoji
AU - Ishigure, Takaaki
N1 - Publisher Copyright:
© 2019 IEEE.
PY - 2019/11
Y1 - 2019/11
N2 - In polymer optical waveguides fabricated using the Mosquito method, the diffusion occurs between the core and cladding monomers during the interim time that is from the moment that the liquid core monomer is dispensed to when the UV curing begins, and a graded-index type refractive index profile is formed in the core. In this paper, the diffusion coefficient of monomer is measured. Then, a diffusion simulation model is created, which can calculate the concentration distribution of monomer using the diffusion coefficient that depends on the monomer concentration. Finally, the refractive index profiles formed in the cores are simulated and the output near-field patterns are theoretically estimated to evaluate the core diameter and numerical aperture dependences on the interim time.
AB - In polymer optical waveguides fabricated using the Mosquito method, the diffusion occurs between the core and cladding monomers during the interim time that is from the moment that the liquid core monomer is dispensed to when the UV curing begins, and a graded-index type refractive index profile is formed in the core. In this paper, the diffusion coefficient of monomer is measured. Then, a diffusion simulation model is created, which can calculate the concentration distribution of monomer using the diffusion coefficient that depends on the monomer concentration. Finally, the refractive index profiles formed in the cores are simulated and the output near-field patterns are theoretically estimated to evaluate the core diameter and numerical aperture dependences on the interim time.
KW - diffusion simulation
KW - monomer diffusion
KW - polymer optical waveguide
KW - the Mosquito method
UR - http://www.scopus.com/inward/record.url?scp=85080932884&partnerID=8YFLogxK
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U2 - 10.1109/ICSJ47124.2019.8998636
DO - 10.1109/ICSJ47124.2019.8998636
M3 - Conference contribution
AN - SCOPUS:85080932884
T3 - 2019 IEEE CPMT Symposium Japan, ICSJ 2019
SP - 145
EP - 146
BT - 2019 IEEE CPMT Symposium Japan, ICSJ 2019
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 9th IEEE CPMT Symposium Japan, ICSJ 2019
Y2 - 18 November 2019 through 20 November 2019
ER -