SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography Toward future mass production of photonic crystal nanocavity devices

Nurul Ashikin Binti Daud, Yuta Ooka, Tomohisa Tabata, Tomohiro Tetsumoto, Takasumi Tanabe

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    1 Citation (Scopus)

    Abstract

    We describe the fabrication and a demonstration of passive and active photonic crystal nanocavity devices, namely an electro-optic modulator, an all-silicon photodetector and a DeMUX filter. This is the first demonstration of active and passive photonic crystal nanocavity devices fabricated with a photolithographic process that may lead to future mass production.

    Original languageEnglish
    Title of host publication2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017
    PublisherInstitute of Electrical and Electronics Engineers Inc.
    Pages1-2
    Number of pages2
    Volume2017-January
    ISBN (Electronic)9781509062904
    DOIs
    Publication statusPublished - 2017 Nov 22
    Event2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017 - Singapore, Singapore
    Duration: 2017 Jul 312017 Aug 4

    Other

    Other2017 Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2017
    Country/TerritorySingapore
    CitySingapore
    Period17/7/3117/8/4

    Keywords

    • Components
    • Electro-optic devices
    • Integrated optics
    • Optical signal processing
    • Opto-electronics
    • Photonic crystal

    ASJC Scopus subject areas

    • Computer Networks and Communications
    • Electronic, Optical and Magnetic Materials
    • Atomic and Molecular Physics, and Optics

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