TY - GEN
T1 - SiO2 clad active and passive photonic crystal nanocavity devices fabricated with photolithography
AU - Daud, Nurul Ashikin Binti
AU - Ooka, Yuta
AU - Tabata, Tomohisa
AU - Tetsumoto, Tomohiro
AU - Tanabe, Takasumi
N1 - Publisher Copyright:
© 2018 Optics InfoBase Conference Papers. All rights reserved.
PY - 2017
Y1 - 2017
N2 - We describe the fabrication and a demonstration of passive and active photonic crystal nanocavity devices, namely an electro-optic modulator, an all-silicon photodetector and a DeMUX filter. This is the first demonstration of active and passive photonic crystal nanocavity devices fabricated with a photolithographic process that may lead to future mass production.
AB - We describe the fabrication and a demonstration of passive and active photonic crystal nanocavity devices, namely an electro-optic modulator, an all-silicon photodetector and a DeMUX filter. This is the first demonstration of active and passive photonic crystal nanocavity devices fabricated with a photolithographic process that may lead to future mass production.
KW - Components
KW - Electro-optic devices
KW - Integrated optics
KW - Optical signal processing
KW - Opto-electronics
KW - Photonic crystal
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M3 - Conference contribution
AN - SCOPUS:85059506415
SN - 9781509062904
T3 - Optics InfoBase Conference Papers
BT - Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2017
PB - Optica Publishing Group (formerly OSA)
T2 - Conference on Lasers and Electro-Optics/Pacific Rim, CLEOPR 2017
Y2 - 31 July 2017 through 4 August 2017
ER -