Stress engineering for high-performance MOSFETs

Ken Uchida

    Research output: Contribution to journalArticlepeer-review

    4 Citations (Scopus)


    Since the conventional strategy, namely scaling of device dimensions in ultimately scaled shorter-channel-length MOS transistors, is less effective to enhance transistor performance, another strategy is strongly demanded. Stress engineering is one of the most promising performance boosters for the ultimately scaled MOS transistors. In this paper, we will introduce the physical mechanisms of the drain current enhancement induced by stress. We will discuss the mechanisms based on the band structure modification by stress. The effectiveness of the stress engineering in future devices is also prospected.

    Original languageEnglish
    Pages (from-to)301-305
    Number of pages5
    JournalJournal of the Vacuum Society of Japan
    Issue number5
    Publication statusPublished - 2008

    ASJC Scopus subject areas

    • Materials Science(all)
    • Instrumentation
    • Surfaces and Interfaces
    • Spectroscopy


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