Structural and impedance studies on LaF3 thin films prepared by vacuum evaporation

M. Vijayakumar, S. Selvasekarapandian, T. Gnanasekaran, Shinobu Fujihara, Shinnosuke Koji

Research output: Contribution to journalArticlepeer-review

33 Citations (Scopus)


Lanthanum fluoride thin film has been deposited on glass substrates by PVD method at various deposition temperatures (Ts), viz, 300, 473, 573 and 673 K. The hexagonal phase LaF3 film has been detected by using glancing angle XRD analysis. The structural parameters such as lattice constants, grain size and micro-strain has been calculated from the XRD data. The F- ion conduction through the grain and grain boundary has been analyzed using impedance analysis. The modulus spectra reveals the non-Debye nature and the distribution of relaxation times of the film.

Original languageEnglish
Pages (from-to)1119-1125
Number of pages7
JournalJournal of Fluorine Chemistry
Issue number7
Publication statusPublished - 2004 Jul


  • Impedance spectroscopy
  • LaF
  • Modulus analysis
  • XRD analysis

ASJC Scopus subject areas

  • Biochemistry
  • Environmental Chemistry
  • Physical and Theoretical Chemistry
  • Organic Chemistry
  • Inorganic Chemistry


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