Structure and optical characterization of nanocrystalline silicon thin films for solar cells

Ryo Morisawa, Akira Shirakura, Chen Chung Du, Jen Rong Huang, Muh Wang Liang, David Ch Wu, Tetsuya Suzuki

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Citation (Scopus)


Effects of very high frequency- plasma enhanced chemical vapor deposition (VHF-PECVD) using diluted ultrapure silane at higher dilution ratio (R>30) on microstructures and optical characteristics of hydrogenated nanocrystalline silicon (nc-Si:H) film were studied. Nanocrystalline silicon films were prepared by at RF power ranging from 50 to 300 W. It was found that the transition from amorphous phase to nanocrystalline phase occurred between 100 W and 150 W. The nucleation mechanism toward nc-Si:H near the transition point of amorphous phase was discussed based on transmission electron microscopy with atomic scale. Further, it is suggested from UV-visible spectroscopy that nc-Si:H films with the best optical properties would be obtained near the transition point from the amorphous phase to the crystalline phase.

Original languageEnglish
Title of host publicationAdvanced Nanostructured Solar Cells
Number of pages6
Publication statusPublished - 2010
Event2009 MRS Fall Meeting - Boston, MA, United States
Duration: 2009 Nov 302009 Dec 4

Publication series

NameMaterials Research Society Symposium Proceedings
ISSN (Print)0272-9172


Other2009 MRS Fall Meeting
Country/TerritoryUnited States
CityBoston, MA

ASJC Scopus subject areas

  • General Materials Science
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering


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