Abstract
A MEMS diffusion sensor utilizing the laser-induced dielectrophoresis is developed, and the photoconductive layer is deposited by the plain reactive RF magnetron sputtering method. The nano-scale size difference is observed using the newly fabricated sensor.
Original language | English |
---|---|
Title of host publication | 2016 International Conference on Optical MEMS and Nanophotonics, OMN 2016 - Proceedings |
Publisher | IEEE Computer Society |
Volume | 2016-September |
ISBN (Electronic) | 9781509010356 |
DOIs | |
Publication status | Published - 2016 Sept 13 |
Event | 21st International Conference on Optical MEMS and Nanophotonics, OMN 2016 - Singapore, Singapore Duration: 2016 Jul 31 → 2016 Aug 4 |
Other
Other | 21st International Conference on Optical MEMS and Nanophotonics, OMN 2016 |
---|---|
Country/Territory | Singapore |
City | Singapore |
Period | 16/7/31 → 16/8/4 |
Keywords
- diffusion coefficient
- laser-induced dielectrophoresis
- photoconductive layer
ASJC Scopus subject areas
- Hardware and Architecture
- Electrical and Electronic Engineering
- Electronic, Optical and Magnetic Materials