Engineering & Materials Science
Amorphous films
89%
Carbon films
86%
Amorphous carbon
85%
Chemical vapor deposition
64%
Atmospheric pressure
62%
Plasmas
50%
Polyethylene terephthalates
43%
Deposition rates
42%
Substrates
23%
Shielding
22%
Acetylene
14%
X ray photoelectron spectroscopy
13%
Gas mixtures
12%
Nitrogen
10%
Wavelength
9%
Gases
6%
Chemical Compounds
Vapor Deposition Apparatus
100%
Plasma Chemical Vapour Deposition
75%
Amorphous Material
38%
Liquid Film
26%
Carbon Atom
25%
Gas
11%
Transmittance
11%
Acetylene
10%
Wavelength
7%
X-Ray Photoelectron Spectroscopy
7%
Nitrogen
6%
Pressure
6%
Mixture
4%
Physics & Astronomy
atmospheric pressure
49%
vapor deposition
42%
synthesis
39%
carbon
36%
polyethylene terephthalate
23%
shielding
12%
rays
11%
acetylene
7%
gas mixtures
6%
low pressure
5%
transmittance
5%
photoelectron spectroscopy
5%
nitrogen
5%
gases
3%
wavelengths
3%
x rays
3%