Theoretical Analysis of Electron-Beam-Excited KrF Laser Performance: New F2 Concentration Optimization

Fumihiko Kannari; Akira Suda; Shigeru Yamaguchi; Minoru Obara; Tomoo Fujioka

doi:10.1109/JQE.1983.1071830

Theoretical Analysis of Electron-Beam-Excited KrF Laser Performance: New F₂ Concentration Optimization

Fumihiko Kannari, Akira Suda, Shigeru Yamaguchi, Minoru Obara, Tomoo Fujioka

Research output: Contribution to journal › Article › peer-review

22 Citations (Scopus)

Abstract

For an electron-beam-excited KrF laser, we analyzed theoretically the dependence of the performance characteristics on the excitation rate and initial F₂ concentration. According to the analysis of KrF* formation processes, KrF* relaxation processes, 248 nm absorption processes, and their individual efficiencies, a novel optimization method for initial F₂ concentrations is necessary instead of a conventional method of a “constant” F₂ burn-up rate. Then, we determined optimum F₂ concentration as a function of the excitation rate for excitation pulses of 20–500 ns FWHM. Finally, we obtained the scaling law for the intrinsic KrF laser efficiency.

Original language	English
Pages (from-to)	232-242
Number of pages	11
Journal	IEEE Journal of Quantum Electronics
Volume	19
Issue number	2
DOIs	https://doi.org/10.1109/JQE.1983.1071830
Publication status	Published - 1983 Feb
Externally published	Yes

ASJC Scopus subject areas

Atomic and Molecular Physics, and Optics
Condensed Matter Physics
Electrical and Electronic Engineering

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10.1109/JQE.1983.1071830

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title = "Theoretical Analysis of Electron-Beam-Excited KrF Laser Performance: New F2 Concentration Optimization",

abstract = "For an electron-beam-excited KrF laser, we analyzed theoretically the dependence of the performance characteristics on the excitation rate and initial F2 concentration. According to the analysis of KrF* formation processes, KrF* relaxation processes, 248 nm absorption processes, and their individual efficiencies, a novel optimization method for initial F2 concentrations is necessary instead of a conventional method of a “constant” F2 burn-up rate. Then, we determined optimum F2 concentration as a function of the excitation rate for excitation pulses of 20–500 ns FWHM. Finally, we obtained the scaling law for the intrinsic KrF laser efficiency.",

author = "Fumihiko Kannari and Akira Suda and Shigeru Yamaguchi and Minoru Obara and Tomoo Fujioka",

year = "1983",

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AU - Kannari, Fumihiko

AU - Suda, Akira

AU - Yamaguchi, Shigeru

AU - Obara, Minoru

AU - Fujioka, Tomoo

PY - 1983/2

Y1 - 1983/2

N2 - For an electron-beam-excited KrF laser, we analyzed theoretically the dependence of the performance characteristics on the excitation rate and initial F2 concentration. According to the analysis of KrF* formation processes, KrF* relaxation processes, 248 nm absorption processes, and their individual efficiencies, a novel optimization method for initial F2 concentrations is necessary instead of a conventional method of a “constant” F2 burn-up rate. Then, we determined optimum F2 concentration as a function of the excitation rate for excitation pulses of 20–500 ns FWHM. Finally, we obtained the scaling law for the intrinsic KrF laser efficiency.

AB - For an electron-beam-excited KrF laser, we analyzed theoretically the dependence of the performance characteristics on the excitation rate and initial F2 concentration. According to the analysis of KrF* formation processes, KrF* relaxation processes, 248 nm absorption processes, and their individual efficiencies, a novel optimization method for initial F2 concentrations is necessary instead of a conventional method of a “constant” F2 burn-up rate. Then, we determined optimum F2 concentration as a function of the excitation rate for excitation pulses of 20–500 ns FWHM. Finally, we obtained the scaling law for the intrinsic KrF laser efficiency.

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Theoretical Analysis of Electron-Beam-Excited KrF Laser Performance: New F₂ Concentration Optimization

Abstract

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