Three-dimensional photonic crystals fabricated by double-angled plasma etching

Shigeki Takahashi; Takeshi Nakamori; Makoto Okano; Masahiro Imada; Susumu Noda

doi:10.1109/CLEO.2007.4453246

Three-dimensional photonic crystals fabricated by double-angled plasma etching

Shigeki Takahashi, Takeshi Nakamori, Makoto Okano, Masahiro Imada, Susumu Noda

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Three-dimensional photonic crystals with a depth of two lattice constants are successfully fabricated by a two-stage angled plasma etching method. The sample showed ∼90% reflectance and ∼10dB attenuation around the photonic bandgap wavelength region.

Original language	English
Title of host publication	Conference on Lasers and Electro-Optics, 2007, CLEO 2007
DOIs	https://doi.org/10.1109/CLEO.2007.4453246
Publication status	Published - 2007 Dec 1
Externally published	Yes
Event	Conference on Lasers and Electro-Optics, 2007, CLEO 2007 - Baltimore, MD, United States Duration: 2007 May 6 → 2007 May 11

Publication series

Name	Conference on Lasers and Electro-Optics, 2007, CLEO 2007

Other

Other	Conference on Lasers and Electro-Optics, 2007, CLEO 2007
Country/Territory	United States
City	Baltimore, MD
Period	07/5/6 → 07/5/11

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials

Access to Document

10.1109/CLEO.2007.4453246

Cite this

Takahashi, S, Nakamori, T, Okano, M, Imada, M & Noda, S 2007, Three-dimensional photonic crystals fabricated by double-angled plasma etching. in Conference on Lasers and Electro-Optics, 2007, CLEO 2007., 4453246, Conference on Lasers and Electro-Optics, 2007, CLEO 2007, Conference on Lasers and Electro-Optics, 2007, CLEO 2007, Baltimore, MD, United States, 07/5/6. https://doi.org/10.1109/CLEO.2007.4453246

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title = "Three-dimensional photonic crystals fabricated by double-angled plasma etching",

abstract = "Three-dimensional photonic crystals with a depth of two lattice constants are successfully fabricated by a two-stage angled plasma etching method. The sample showed ∼90% reflectance and ∼10dB attenuation around the photonic bandgap wavelength region.",

author = "Shigeki Takahashi and Takeshi Nakamori and Makoto Okano and Masahiro Imada and Susumu Noda",

year = "2007",

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doi = "10.1109/CLEO.2007.4453246",

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T1 - Three-dimensional photonic crystals fabricated by double-angled plasma etching

AU - Takahashi, Shigeki

AU - Nakamori, Takeshi

AU - Okano, Makoto

AU - Imada, Masahiro

AU - Noda, Susumu

PY - 2007/12/1

Y1 - 2007/12/1

N2 - Three-dimensional photonic crystals with a depth of two lattice constants are successfully fabricated by a two-stage angled plasma etching method. The sample showed ∼90% reflectance and ∼10dB attenuation around the photonic bandgap wavelength region.

AB - Three-dimensional photonic crystals with a depth of two lattice constants are successfully fabricated by a two-stage angled plasma etching method. The sample showed ∼90% reflectance and ∼10dB attenuation around the photonic bandgap wavelength region.

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DO - 10.1109/CLEO.2007.4453246

M3 - Conference contribution

AN - SCOPUS:82955233784

SN - 9781557528346

T3 - Conference on Lasers and Electro-Optics, 2007, CLEO 2007

BT - Conference on Lasers and Electro-Optics, 2007, CLEO 2007

T2 - Conference on Lasers and Electro-Optics, 2007, CLEO 2007

Y2 - 6 May 2007 through 11 May 2007

ER -

Three-dimensional photonic crystals fabricated by double-angled plasma etching

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