TY - JOUR
T1 - Three Dimensional Structures of Negative-tone Photoresist by Binary Optics
AU - Hana, Kei
AU - Shimizu, Sayaka
AU - Matsumoto, Yoshinori
N1 - Copyright:
Copyright 2017 Elsevier B.V., All rights reserved.
PY - 2005
Y1 - 2005
N2 - Binary optics is one of the effective methods to form three dimensional micro structure. In this study, Binary optics was applied to negative-tone photoresist of SU-8 with substrate penetration method, and three-dimensional structures with 16 levels were fabricated by 4 times exposure and development processes. We also propose the new technique to generate mask patterns for binary optics by image-processing which dramatically reduces effort of designing mask pattern. Keywords : binary optics, SU-8, substrate penetration method.
AB - Binary optics is one of the effective methods to form three dimensional micro structure. In this study, Binary optics was applied to negative-tone photoresist of SU-8 with substrate penetration method, and three-dimensional structures with 16 levels were fabricated by 4 times exposure and development processes. We also propose the new technique to generate mask patterns for binary optics by image-processing which dramatically reduces effort of designing mask pattern. Keywords : binary optics, SU-8, substrate penetration method.
KW - SU-8
KW - binary optics
KW - substrate penetration method
UR - http://www.scopus.com/inward/record.url?scp=79952775904&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=79952775904&partnerID=8YFLogxK
U2 - 10.1541/ieejsmas.125.424
DO - 10.1541/ieejsmas.125.424
M3 - Article
AN - SCOPUS:79952775904
SN - 1341-8939
VL - 125
SP - 424
EP - 425
JO - ieej transactions on sensors and micromachines
JF - ieej transactions on sensors and micromachines
IS - 10
ER -