抄録
A single-chip low-IF transmitter for the Bluetooth Enhanced Data Rate (max. 3Mbps) was fabricated in 0.18-μm CMOS process. A quantitative study on the relation between the VCO pulling, intermediate frequency, and the linearity of the PA shows that the IMHz-IF is the best solution. By a digital DC offset cancellation and I/Q mismatch trimming techniques, the LO and image signal leakages are suppressed below -40dBc and -50dBc, respectively.
本文言語 | English |
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ページ | 298-301 |
ページ数 | 4 |
DOI | |
出版ステータス | Published - 2005 |
外部発表 | はい |
イベント | 2005 Symposium on VLSI Circuits - Kyoto, Japan 継続期間: 2005 6月 16 → 2005 6月 18 |
Other
Other | 2005 Symposium on VLSI Circuits |
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国/地域 | Japan |
City | Kyoto |
Period | 05/6/16 → 05/6/18 |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- 電子工学および電気工学