A two-step process for growth of highly oriented Sb2Te3 using sputtering

Yuta Saito, Paul Fons, Leonid Bolotov, Noriyuki Miyata, Alexander V. Kolobov, Junji Tominaga

研究成果: Article査読

44 被引用数 (Scopus)

抄録

A two-step growth method is proposed for the fabrication of highly-oriented Sb2Te3 and related superlattice films using sputtering. We report that the quality and grain size of Sb2Te3 as well as GeTe/Sb2Te3 superlattice films strongly depend on the thickness of the room-temperature deposited and subsequently by annealing at 523 K Sb2Te3 seed layer. This result may open up new possibilities for the fabrication of two-dimensional electronic devices using layered chalcogenides.

本文言語English
論文番号045220
ジャーナルAIP Advances
6
4
DOI
出版ステータスPublished - 2016 4月 1
外部発表はい

ASJC Scopus subject areas

  • 物理学および天文学(全般)

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