TY - JOUR
T1 - Dependence of driving frequency on capacitively coupled plasma in CF4
AU - Segawa, Sumie
AU - Kurihara, Masaru
AU - Nakano, Nobuhiko
AU - Makabe, Toshiaki
PY - 1999/7
Y1 - 1999/7
N2 - A radio-frequency CF4 plasma in reactive-ion etcher with parallel plate geometry is investigated in one dimension at a position space using the relaxation continuum model. The discharge with negative ions has the double layer similar in appearance to O2; the structure and mechanism are markedly changed as a function of driving frequency. The effect of driving frequency is numerically studied between 13.56 MHz and 200 MHz for 200 mTorr and 50 mTorr. In these studies, the plasma density is kept constant at approx. 1011 cm-3, considering the charged species CF3+, CF2+, CF+, C+, F+, F-, and electrons. The mean energy of charged particles is also discussed.
AB - A radio-frequency CF4 plasma in reactive-ion etcher with parallel plate geometry is investigated in one dimension at a position space using the relaxation continuum model. The discharge with negative ions has the double layer similar in appearance to O2; the structure and mechanism are markedly changed as a function of driving frequency. The effect of driving frequency is numerically studied between 13.56 MHz and 200 MHz for 200 mTorr and 50 mTorr. In these studies, the plasma density is kept constant at approx. 1011 cm-3, considering the charged species CF3+, CF2+, CF+, C+, F+, F-, and electrons. The mean energy of charged particles is also discussed.
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U2 - 10.1143/jjap.38.4416
DO - 10.1143/jjap.38.4416
M3 - Article
AN - SCOPUS:0033157678
SN - 0021-4922
VL - 38
SP - 4416
EP - 4422
JO - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
JF - Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
IS - 7 B
ER -