Dependence of driving frequency on capacitively coupled plasma in CF4

Sumie Segawa, Masaru Kurihara, Nobuhiko Nakano, Toshiaki Makabe

研究成果: Article査読

38 被引用数 (Scopus)


A radio-frequency CF4 plasma in reactive-ion etcher with parallel plate geometry is investigated in one dimension at a position space using the relaxation continuum model. The discharge with negative ions has the double layer similar in appearance to O2; the structure and mechanism are markedly changed as a function of driving frequency. The effect of driving frequency is numerically studied between 13.56 MHz and 200 MHz for 200 mTorr and 50 mTorr. In these studies, the plasma density is kept constant at approx. 1011 cm-3, considering the charged species CF3+, CF2+, CF+, C+, F+, F-, and electrons. The mean energy of charged particles is also discussed.

ジャーナルJapanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
7 B
出版ステータスPublished - 1999 7月

ASJC Scopus subject areas

  • 工学一般
  • 物理学および天文学一般


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