Development of NiFe micro magnet stripes for solid-state NMR quantum computing

A. Takahashi, Dong F. Wang, Y. Matsumoto, K. M. Itoh

研究成果: Conference article査読

1 被引用数 (Scopus)

抄録

An all-silicon quantum computer architecture using 29Si nuclear spins qubits buried in the spin-free matrix of 28Si has been suggested [1]. It requires an array of micro-magnets which impose a large magnetic field gradient along the chain of the 29Si nuclear spins qubits, which allow for the NMR frequency difference between two neighboring 29Si qubits. In this work, we report on the successful fabrication of an array of NiFe (Ni45%-Fe55%) micro-magnet stripes (the cross-section 1.2x1 μm 2) formed directly on natural Si wafers using reactive ion etching (RIE) with the NH3-CO-Xe gas mixture. The magnetic field gradient calculation with the finite element method with the geometry of the fabricated NiFe stripes predicts the gradient of 0.4T/μm at the distance 100nm away from the micro-magnet when the stripes are placed in the static magnetic field of 6T for the NMR measurement. The magnetic property of fabricated NiFe stripes was also measured with SQUID, and confirmed that saturation magnetization hadn't been deteriorated through RIE process.

本文言語English
論文番号16
ページ(範囲)81-88
ページ数8
ジャーナルProceedings of SPIE - The International Society for Optical Engineering
5650
DOI
出版ステータスPublished - 2005
イベントMicro- and Nanotechnology: Materials, Processes, Packaging, and Systems II - Sydney, Australia
継続期間: 2004 12月 132004 12月 15

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • コンピュータ サイエンスの応用
  • 応用数学
  • 電子工学および電気工学

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