Effects of the Ar and He dilution gas mixture ratio on the hardness of a-C:H films synthesized by atmospheric pressure plasma enhanced chemical vapor deposition

Engineering & Materials Science

• Plasma enhanced chemical vapor deposition 100%
• Gas mixtures 79%
• Atmospheric pressure 78%
• Dilution 77%
• Hardness 55%
• Hydrogen 31%
• Ion bombardment 25%
• Atoms 16%
• Amorphous carbon 12%
• Gases 8%
• Plasmas 7%
• Ions 7%
• Surface roughness 6%

Physics & Astronomy

• dilution 70%
• gas mixtures 66%
• atmospheric pressure 62%
• hardness 55%
• vapor deposition 54%
• hydrogen 19%
• bombardment 14%
• Penning effect 13%
• ions 10%
• metastable atoms 10%
• mixing ratios 9%
• detachment 8%
• gases 8%
• surface roughness 6%
• carbon 5%
• atoms 3%

Chemical Compounds

• Plasma Enhanced Chemical Vapour Deposition 84%
• Dilution 57%
• Pressure 40%
• Gas 37%
• Liquid Film 34%
• Mixture 30%
• Ion Bombardment 20%
• Hydrogen 15%
• Deposition Process 8%
• Surface Roughness 7%
• Amorphous Material 5%
• Plasma 4%
• Carbon Atom 3%
• Amount 3%
• Ion 3%
• Surface 2%