Energy spectrum of the quantum-dot in a Si single-electron device

Hiroki Ishikuro, Toshiro Hiramoto

研究成果: Paper査読

3 被引用数 (Scopus)

抄録

A point contact metal oxide semiconductor field effect transistor (MOSFET) is used as a single quantum dot transistor fabricated on a silicon on insulator (SOI) substrate using the anisotropic etching technique. The energy spectrum of the quantum dot is extracted in Si single electron transistor from the gate voltage and drain voltage dependence of the drain current. The negative differential conductance (NDC) is observed in Si single electron transistor. Accurate understanding of the electronic states in the dot is important for the design of extremely small single electron devices for the room temperature operation.

本文言語English
ページ84-85
ページ数2
出版ステータスPublished - 1997 1月 1
外部発表はい
イベントProceedings of the 1997 55th Annual Device Research Conference - Fort Collins, CO, USA
継続期間: 1997 6月 231997 6月 25

Other

OtherProceedings of the 1997 55th Annual Device Research Conference
CityFort Collins, CO, USA
Period97/6/2397/6/25

ASJC Scopus subject areas

  • 工学(全般)

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