Fabrication method for nanocluster superatoms with high-power impulse magnetron sputtering

Hironori Tsunoyama, Masahide Tona, Keizo Tsukamoto, Atsushi Nakajima

研究成果: Review article査読

抄録

Intensive ion source for single-size nanoclusters was developed on the basis of high-power impulse magnetron sputtering (HiPIMS) technique combined with a low-pressure, low-temperature gas flow reactor. The nanocluster source exhibits superior characteristics originating from pulsed, high-power sputtering compared to conventional direct-current sputtering; (1) enhanced ion intensities, (2) fascicle tuning of nanocluster sizes, and (3) enhanced selectivity of stable, magic nanoclusters. The metallic (silver, platinum, and palladium) and binary (transition-metal and silicon) nanocluster ions in the size range of several to one hundred atoms can be generated with ion current of 100 pA to 10 nA (108 to 1011 nanoclusters/sec). The growth mechanism of nanoclusters in the source was also explained by the nucleation theory.

本文言語English
ページ(範囲)352-361
ページ数10
ジャーナルJournal of the Vacuum Society of Japan
60
9
DOI
出版ステータスPublished - 2017

ASJC Scopus subject areas

  • 材料科学一般
  • 器械工学
  • 表面および界面
  • 分光学

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