Fabrication method of sub-micrometer size planar gap for the micro fabry-perot interferometer

T. Dohi; H. Hayashi; H. Onoe; K. Matsumoto; I. Shimoyama

doi:10.1109/MEMSYS.2008.4443661

Fabrication method of sub-micrometer size planar gap for the micro fabry-perot interferometer

T. Dohi, H. Hayashi, H. Onoe, K. Matsumoto, I. Shimoyama

研究成果: Conference contribution

5 被引用数 (Scopus)

抄録

This paper reports on a fabrication method of sub-micrometer size tunable planar gaps for micro Fabry-Perot interferometers. We made an upper unit with a movable sub-micrometer step and a lower unit, separately. The upper unit was picked up and transferred to the lower unit by the stamping apparatus, and bonded to the lower unit by fusion bonding. Since the force during fusion bonding acts within a few nanometers only, the sub-micrometer size planar gap can be built. By using this fabrication method, we fabricated the 850 nm gap with a movable planar mirror of 500 μm in diameter. The gap was changed from 825 nm to 1020 nm by applying the voltage of 24 V.

本文言語	English
ホスト出版物のタイトル	MEMS 2008 Tucson - 21st IEEE International Conference on Micro Electro Mechanical Systems
ページ	335-338
ページ数	4
DOI	https://doi.org/10.1109/MEMSYS.2008.4443661
出版ステータス	Published - 2008 8月 29
外部発表	はい
イベント	21st IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2008 Tucson - Tucson, AZ, United States 継続期間: 2008 1月 13 → 2008 1月 17

出版物シリーズ

名前	Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)
ISSN（印刷版）	1084-6999

Other

Other	21st IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2008 Tucson
国/地域	United States
City	Tucson, AZ
Period	08/1/13 → 08/1/17

ASJC Scopus subject areas

電子材料、光学材料、および磁性材料
凝縮系物理学
機械工学
電子工学および電気工学

文献へのアクセス

10.1109/MEMSYS.2008.4443661

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引用スタイル

Dohi, T., Hayashi, H., Onoe, H., Matsumoto, K., & Shimoyama, I. (2008). Fabrication method of sub-micrometer size planar gap for the micro fabry-perot interferometer. In MEMS 2008 Tucson - 21st IEEE International Conference on Micro Electro Mechanical Systems (pp. 335-338). Article 4443661 (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)). https://doi.org/10.1109/MEMSYS.2008.4443661

Fabrication method of sub-micrometer size planar gap for the micro fabry-perot interferometer. / Dohi, T.; Hayashi, H.; Onoe, H. その他.
MEMS 2008 Tucson - 21st IEEE International Conference on Micro Electro Mechanical Systems. 2008. p. 335-338 4443661 (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)).

研究成果: Conference contribution

Dohi, T, Hayashi, H, Onoe, H, Matsumoto, K & Shimoyama, I 2008, Fabrication method of sub-micrometer size planar gap for the micro fabry-perot interferometer. in MEMS 2008 Tucson - 21st IEEE International Conference on Micro Electro Mechanical Systems., 4443661, Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS), pp. 335-338, 21st IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2008 Tucson, Tucson, AZ, United States, 08/1/13. https://doi.org/10.1109/MEMSYS.2008.4443661

Dohi T, Hayashi H, Onoe H, Matsumoto K, Shimoyama I. Fabrication method of sub-micrometer size planar gap for the micro fabry-perot interferometer. In MEMS 2008 Tucson - 21st IEEE International Conference on Micro Electro Mechanical Systems. 2008. p. 335-338. 4443661. (Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)). doi: 10.1109/MEMSYS.2008.4443661

@inproceedings{1c2a656e44c6447d9a4233525334fb7c,

title = "Fabrication method of sub-micrometer size planar gap for the micro fabry-perot interferometer",

abstract = "This paper reports on a fabrication method of sub-micrometer size tunable planar gaps for micro Fabry-Perot interferometers. We made an upper unit with a movable sub-micrometer step and a lower unit, separately. The upper unit was picked up and transferred to the lower unit by the stamping apparatus, and bonded to the lower unit by fusion bonding. Since the force during fusion bonding acts within a few nanometers only, the sub-micrometer size planar gap can be built. By using this fabrication method, we fabricated the 850 nm gap with a movable planar mirror of 500 μm in diameter. The gap was changed from 825 nm to 1020 nm by applying the voltage of 24 V.",

author = "T. Dohi and H. Hayashi and H. Onoe and K. Matsumoto and I. Shimoyama",

year = "2008",

month = aug,

day = "29",

doi = "10.1109/MEMSYS.2008.4443661",

language = "English",

isbn = "9781424417933",

series = "Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)",

pages = "335--338",

booktitle = "MEMS 2008 Tucson - 21st IEEE International Conference on Micro Electro Mechanical Systems",

note = "21st IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2008 Tucson ; Conference date: 13-01-2008 Through 17-01-2008",

}

TY - GEN

T1 - Fabrication method of sub-micrometer size planar gap for the micro fabry-perot interferometer

AU - Dohi, T.

AU - Hayashi, H.

AU - Onoe, H.

AU - Matsumoto, K.

AU - Shimoyama, I.

PY - 2008/8/29

Y1 - 2008/8/29

N2 - This paper reports on a fabrication method of sub-micrometer size tunable planar gaps for micro Fabry-Perot interferometers. We made an upper unit with a movable sub-micrometer step and a lower unit, separately. The upper unit was picked up and transferred to the lower unit by the stamping apparatus, and bonded to the lower unit by fusion bonding. Since the force during fusion bonding acts within a few nanometers only, the sub-micrometer size planar gap can be built. By using this fabrication method, we fabricated the 850 nm gap with a movable planar mirror of 500 μm in diameter. The gap was changed from 825 nm to 1020 nm by applying the voltage of 24 V.

AB - This paper reports on a fabrication method of sub-micrometer size tunable planar gaps for micro Fabry-Perot interferometers. We made an upper unit with a movable sub-micrometer step and a lower unit, separately. The upper unit was picked up and transferred to the lower unit by the stamping apparatus, and bonded to the lower unit by fusion bonding. Since the force during fusion bonding acts within a few nanometers only, the sub-micrometer size planar gap can be built. By using this fabrication method, we fabricated the 850 nm gap with a movable planar mirror of 500 μm in diameter. The gap was changed from 825 nm to 1020 nm by applying the voltage of 24 V.

UR - http://www.scopus.com/inward/record.url?scp=50149109023&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=50149109023&partnerID=8YFLogxK

U2 - 10.1109/MEMSYS.2008.4443661

DO - 10.1109/MEMSYS.2008.4443661

M3 - Conference contribution

AN - SCOPUS:50149109023

SN - 9781424417933

T3 - Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

SP - 335

EP - 338

BT - MEMS 2008 Tucson - 21st IEEE International Conference on Micro Electro Mechanical Systems

T2 - 21st IEEE International Conference on Micro Electro Mechanical Systems, MEMS 2008 Tucson

Y2 - 13 January 2008 through 17 January 2008

ER -

Fabrication method of sub-micrometer size planar gap for the micro fabry-perot interferometer

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