Fined-grained body biasing for frequency scaling in advanced SOI processes

Johannes Maximilian Kuhn, Hideharu Amano, Oliver Bringmann, Wolfgang Rosenstiel

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

New SOI processes offer unprecedented flexibility in regard to low-power and performance. The use of fine-grained body biasing in STMicro's 28nm UTBB-FDSOI is evaluated for a Dynamically Reconfigurable Processor design in a frequency scaling scenario. Three different strategies are evaluated for Processing Elements: Static, programmable and dynamic body biasing. Fine-grained body biasing significantly mitigates increased leakage currents of forward body biasing between 42.85% to 64.5% on average. This makes static body biasing a viable low-cost option and makes dynamic body biasing worthwhile even at short time periods.

本文言語English
ホスト出版物のタイトルIEEE Symposium on Low-Power and High-Speed Chips, COOL Chips XVIII - Proceedings
出版社Institute of Electrical and Electronics Engineers Inc.
ISBN(電子版)9781467373258
DOI
出版ステータスPublished - 2015 7月 14
イベント18th IEEE Symposium on Low-Power and High-Speed Chips, COOL Chips 2015 - Yokohama, Japan
継続期間: 2015 4月 132015 4月 15

出版物シリーズ

名前IEEE Symposium on Low-Power and High-Speed Chips, COOL Chips XVIII - Proceedings

Other

Other18th IEEE Symposium on Low-Power and High-Speed Chips, COOL Chips 2015
国/地域Japan
CityYokohama
Period15/4/1315/4/15

ASJC Scopus subject areas

  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学

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