Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction

Yoshinori Matsumoto; Kazumasa Yoshida; Makoto Ishida

Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction

Yoshinori Matsumoto, Kazumasa Yoshida, Makoto Ishida

研究成果: Paper › 査読

抄録

Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. At first, FC film was spin-coated from Cyclized Perfluoro Polymer (CPFP) commercialized as CYTOP. Because of the excellent durability for alkali or acid, the FC film was used for protection of circuit area of integrated accelerometer during silicon alkaline etching process by 25 wt% TMAH at 90 °C. Second, FC films were formed on a field-free zone with a capacitive coupling type plasma polymerization equipment using perfluorinated liquid (C₇F₁₆,C₈F₁₈ etc.) as monomer species. The deposition rate and thermal stability of the films were investigated. The FC films are effective for elimination of in-use stiction for surface micromachining devices.

本文言語	English
ページ	695-698
ページ数	4
出版ステータス	Published - 1997 1月 1
外部発表	はい
イベント	Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2) - Chicago, IL, USA 継続期間: 1997 6月 16 → 1997 6月 19

Other

Other	Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2)
City	Chicago, IL, USA
Period	97/6/16 → 97/6/19

ASJC Scopus subject areas

工学（全般）

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title = "Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction",

abstract = "Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. At first, FC film was spin-coated from Cyclized Perfluoro Polymer (CPFP) commercialized as CYTOP. Because of the excellent durability for alkali or acid, the FC film was used for protection of circuit area of integrated accelerometer during silicon alkaline etching process by 25 wt% TMAH at 90 °C. Second, FC films were formed on a field-free zone with a capacitive coupling type plasma polymerization equipment using perfluorinated liquid (C7F16,C8F18 etc.) as monomer species. The deposition rate and thermal stability of the films were investigated. The FC films are effective for elimination of in-use stiction for surface micromachining devices.",

author = "Yoshinori Matsumoto and Kazumasa Yoshida and Makoto Ishida",

year = "1997",

month = jan,

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note = "Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2) ; Conference date: 16-06-1997 Through 19-06-1997",

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T1 - Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction

AU - Matsumoto, Yoshinori

AU - Yoshida, Kazumasa

AU - Ishida, Makoto

PY - 1997/1/1

Y1 - 1997/1/1

N2 - Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. At first, FC film was spin-coated from Cyclized Perfluoro Polymer (CPFP) commercialized as CYTOP. Because of the excellent durability for alkali or acid, the FC film was used for protection of circuit area of integrated accelerometer during silicon alkaline etching process by 25 wt% TMAH at 90 °C. Second, FC films were formed on a field-free zone with a capacitive coupling type plasma polymerization equipment using perfluorinated liquid (C7F16,C8F18 etc.) as monomer species. The deposition rate and thermal stability of the films were investigated. The FC films are effective for elimination of in-use stiction for surface micromachining devices.

AB - Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. At first, FC film was spin-coated from Cyclized Perfluoro Polymer (CPFP) commercialized as CYTOP. Because of the excellent durability for alkali or acid, the FC film was used for protection of circuit area of integrated accelerometer during silicon alkaline etching process by 25 wt% TMAH at 90 °C. Second, FC films were formed on a field-free zone with a capacitive coupling type plasma polymerization equipment using perfluorinated liquid (C7F16,C8F18 etc.) as monomer species. The deposition rate and thermal stability of the films were investigated. The FC films are effective for elimination of in-use stiction for surface micromachining devices.

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T2 - Proceedings of the 1997 International Conference on Solid-State Sensors and Actuators. Part 1 (of 2)

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ER -

Fluorocarbon film for protection from alkaline etchant and elimination of in-use stiction

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Other

ASJC Scopus subject areas

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